ICBEA 2020 - 2020 4th International Conference on Biometric Engineering and Applications (ICBEA 2020)--Ei Compendex, Scopus
View: 1347
Website http://icbea.org/ |
Edit Freely
Category Biometric Engineering;Remote biometrics
Deadline: April 15, 2020 | Date: May 22, 2020-May 24, 2020
Venue/Country: Xi’an, China
Updated: 2020-03-27 11:41:22 (GMT+9)
Call For Papers - CFP
2020 4th International Conference on Biometric Engineering and Applications (ICBEA 2020) will be held in Northwestern Polytechnical University, Xi'an, China during May 22-24, 2020. Conference Website: http://www.icbea.org/Publication:Accepted and registered papers of ICBEA 2020 can be published in ACM Conference Proceedings (ISBN: 978-1-4503-8765-1), which will be archived in ACM Digital Library, indexed by Ei Compendex and Scopus, and submitted to be reviewed by Thomson Reuters Conference Proceedings Citation Index (ISI Web of Science).Conference Venue:Chang'an Campus of Northwestern Polytechnical University, Xi'an, ChinaAddr.: 1 Dongxiang Road, Chang'an District, Xi'an Shaanxi, 710129, ChinaWebsite: http://www.nwpu.edu.cn/Submission and Contact Methods:Submission Methods: http://confsys.iconf.org/submission/icbea2020E-mail: icbeacbees.netTel: +852-3500-0137 (English)/+86-28-86528465 (Chinese)Conference Specialist: Ms. Olia LaiICBEA 2020 can provide a platform for academic communication in Biometric Engineering and Applications as well as related areas. For more conference information, please visit the conference website: http://www.icbea.org/
Keywords: Accepted papers list. Acceptance Rate. EI Compendex. Engineering Index. ISTP index. ISI index. Impact Factor.
Disclaimer: ourGlocal is an open academical resource system, which anyone can edit or update. Usually, journal information updated by us, journal managers or others. So the information is old or wrong now. Specially, impact factor is changing every year. Even it was correct when updated, it may have been changed now. So please go to Thomson Reuters to confirm latest value about Journal impact factor.